Contract for the supply of scientific instruments and equipment to the International Iberian Nanotechnology Laboratory

… (UHV-AFM).1) The system should include two separated ultrahigh vacuum chambers, one to house the AFM and one prepared for surface analysis techniques.2) A load-lock should be supplied to bring samples and AFM tips into the analysis or the AFM chamber. It should allow simultaneous sample transfer of at least 3 samples or tips.3) The analysis chamber should be equipped at least with flanges for optical access, LEED/Auger, manipulator, sputtering, heating, evaporation sources, and transfer to the UHV-AFM, the load-lock and the molecular beam epitaxy system of Lot 1,3. The flange layout will be specified in the design phase.4) A sample manipulator for sample movement in three axes + rotation to provide access to all surface analysis techniques should be included.5) The analysis chamber should be equipped with the possibility to heat samples resistively and/or by electron bombardment. The accessible temperature range should be at least up to 900°C. Additionally, also direct current heating should be possible. The corresponding control electronics should be included.6) The AFM chamber should be equipped with appropriate flanges to allow convenient scanning probe microscopy operation, including visual access to the sample region. Flange layout will be specified in the design phase.7) The analysis and/or the AFM chamber should provide capacity to store at least 6 samples/tips.8) Appropriate pumping systems for the AFM and analysis chambers of point 1) and the load-lock of point 2) should be provided. All control electronics for the pumping systems should be included. Vacuum better than 3*10-10 mbar should be reached in the analysis and the AFM chambers.9) Appropriate pressure measurement equipment for the AFM and analysis chambers of point 1) and the load-lock of point 2) should be provided. The corresponding electronics should be included.10) A suitable and convenient baking system for the AFM and analysis chambers of point 1) and the load lock of point 2) should be supplied, including the corresponding control electronics.11) A solid support table for the AFM and analysis chambers of point 1) should be included. The support table should be fitted with air-damped legs to improve vibration insulation for AFM operation.12) All required sample handling equipment for transfer between the AFM and analysis chambers of points 1) and the load-lock should be included. The analysis chamber should also be prepared for transfer of samples from the MBE system of Part 3.13) A scanning probe microscopy setup for UHV operation in the chamber specified in point 1) should be included. Operation modes have to include at least scanning tunneling microscopy, non-contact atomic force microscopy (NC-AFM), Kelvin probe force microscopy, and spectroscopic modes of tunneling and force microscopy.14) The microscope should allow sample cooling and heating during the measurement in a temperature range of at least 50 K to 450 K. The appropriate temperature controller should be included.15) The microscope should provide at least one optical access to the sample during the measurement, for visual inspection and/or sample illumination.Options:The following optional additions for the ultrahigh vacuum atomic force microscopy system should be offered, offers for other options are welcome:1) A sputter gun to be mounted to the analysis chamber of point 1), including the appropriate gas line and control electronics.2) A combined LEED/Auger package, comprising all required parts, electronics and software.3) A Quadrupole mass spectrometer.4) A pyrometer for the measurement of sample temperatures up to 1500 K.

… (UHV-AFM).

… Materials.1) The system should include one ultrahigh vacuum growth chamber equipped with an adequate cryo shroud. The chamber should provide at least flanges for 10 evaporation sources, a manipulator, a load lock, sample handling, sample transfer to the analysis chamber of the ultrahigh vacuum atomic force microscope (UHV-AFM) of Part 1, a RHEED system, optical access to the sample for pyrometer and laser light scattering, a quadrupole mass spectrometer, a beam flux monitor and a film thickness monitor. The flange layout will be specified in the design phase.2) A load-lock should be provided to transfer substrates and samples into the growth chamber.3) A manipulator should be supplied allowing continuous substrate rotation during deposition and substrate heating to at least 850°C. The manipulator should be designed for at least 2 inch wafers, with possibility to grow on several smaller substrates for in-vacuum transfer and analysis in the UHV-AFM of Lot 1,1. This should include the possibility to grow simultaneously on at least one sample for the UHV-AFM analysis and at least one sample with 2.5 cm by 2.5 cm size. The manipulator should contain a main shutter.4) Appropriate pumping systems for the growth chamber of point 1) and the load lock of point 2) should be provided. All control electronics for the pumping systems should be included. Vacuum better than 3*10-10 mbar should be reached in the growth chamber.5) Appropriate pressure measurement equipment for the growth chamber of point 1) and the load lock of point 2) should be provided. The corresponding electronics should be included.6) A suitable and convenient baking system for the growth chamber of point 1) and the load lock of point 2) should be supplied, including the corresponding control electronics.7) A solid support table for the whole setup should be included.8) All required sample handling equipment for transfer between the load-lock and the growth chamber should be included. Additionally, also the required equipment for sample transfer to the analysis chamber of the UHV-AFM of Lot 1,1 should be included.9) A suitable connection between the MBE system (Lot 1,3) and the UHV-AFM system (Lot 1,1) should be included allowing for independent and simultaneous operation of the MBE and the UHV-AFM system. Specifically, this connection has to avoid transmission of vibrations to the UHV-AFM. The connection should also be prepared for convenient physical separation and reconnection of the systems.10) Adequate evaporation sources for the evaporation of Cu, In and Se should be included. They should bring all the required power supplies and control devices for computer controlled operation. The source material capacity should be at least 30 cm3.11) A convenient control software for automatized growth should be provided, allowing the control of at least 10 evaporation sources, the programming of complex evaporation cycles, substrate and shutter control and monitoring of system conditions.12) A quartz microbalance for film thickness monitoring should be provided, including all required control electronics13) The offer should include a comprehensive description (possibly including drawings or sketches) of how samples will be mounted in the MBE manipulator and how they will be transferred into the UHV-AFM of Lot 1,1). This transfer has to be realized under UHV conditions at a pressure better than 5*10-10mbar.Options:The following optional additions for the ultrahigh vacuum molecular beam epitaxy system should be offered:1) A suitable evaporation source for the evaporation of Ga.2) A suitable evaporation source for the evaporation of a compound semiconductor, i.e. CdS, ZnSe or In2S3.3) A suitable source for the deposition of Mo.4) A valved cracker cell for the evaporation of Se (if not included in the main setup).5) Optional other sources for the deposition of Cu, In and Se can also be offered.6) A complete RHEED system for in-situ growth monitoring including power supplies and control software. The RHEED system should operate at voltages up to at least 10 kV.7) A Quadrupole mass spectrometer.8) A pyrometer for the measurement of substrate temperature.

… Materials.

… System.INL is seeking the acquisition of a quartz tube furnace for single wafer thermal Low-Pressure and Atmospheric-Pressure Chemical Vapour Deposition (LPCVD and APCVD) on 100 mm diameter wafers. The system will be installed in INL’s cleanroom. The system will be used for graphene and carbon nanotube (CNT) growth using metal catalysts. The tool must be cleanroom compatible and should comply with the following technical specifications:1) A quartz tube single wafer reactor with gas injector and sample holder capable of processing wafers with a diameter of up to 100mm for Graphene and carbon nanotube (CNT) growth from metallic catalysts. Single wafer reactor means a reactor with simultaneous processing capability of one to a few wafers, as opposed to standard batch processing systems with high throughput.2) A three zone heating furnace capable of heating the reactor process zone to a user defined temperature in the range from RT up to 1100ºC and keep it stable during the growth time (in the range from minutes to hours).3) The process zone should have a uniform temperature within a <1ºC error.4) The system is capable of operation in low pressure mode (LPCVD) and the operation pressure is precisely adjustable and kept stable in the range from 100 mTorr to 700 Torr.5) The system is capable of operation in atmospheric pressure mode (APCVD), handling CH4 and H2 or C2H4 and H2 (optional) gas mixtures in safety.6) Four mass flow controlled process gas lines available for the following process gases: methane (CH4), hydrogen (H2) (high flow), hydrogen (H2) (low flow), argon (Ar).7) Option for additional process gas lines (ammonia (NH3), helium (He), acetylene (C2H2)).8) All gas lines will be connected to the INL clean room gas lines that will supply the process and other gases to the system at the desired line pressure.9) The reactor is designed for safety with a flammable gas leak detection system that triggers the shutdown of the flammable gas line and floods the reactor with an inert gas, when actuated.10) The system allows for rapid heat-up and cooling down of the substrate in an inert gas atmosphere.11) The process parameters for Graphene growth are made available to INL and verified in place as part of the system acceptance tests.12) The process is automated and controlled by proprietary or other software installed in a PC computer that communicates via a hardware interface with the CVD system tool.

… System.